物理气相沉积

Multi tool use
物理气相沉积(英语:Physical vapor deposition,PVD)是一種工業製造上的工藝,是主要利用物理过程来沉积薄膜的技术,即真空鍍膜(蒸鍍),多用在鈑金件、蝕刻件、擠壓件、金屬射出成型(MIM)、粉末射出成型(PIM)、機加件和焊接件等零件的工藝上。
和化学气相沉积相比,物理气相沉积适用范围广泛,几乎所有材料的薄膜都可以用物理气相沉积来制备,但是薄膜厚度的均匀性是物理气相沉积中的一个问题。
主要的物理气相沉积的方法有:
外部連結
- Society of Vacuum Coaters
PVD Animation—an animation of a generic PVD sputter tool
- Physical vapor deposition
半导体物理学
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原理 |
- 本征半导体
- 杂质半导体
- 能带结构
- 导带
- 价带
- 能隙
载流子
- 施主
- 受主
- 光生伏打效应
- 半导体激光
- 霍尔效应
- 肖特基势垒
- 欧姆接触
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工艺 |
- 光刻
- 刻蚀
掺杂
- 离子注入
- 分子束外延
- 物理气相沉积
- 化学气相沉积
- 化学机械平坦化
- SOI
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器件 |
- PN结
晶体管
- 二極體
- 發光二極管
- BJT
- FET
- MOSFET
- CMOS
- 晶閘管
- 薄膜晶体管
- 太阳能电池
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工程主题
技术主题
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